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Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam... more
Results of ion implantation of nitrogen into electrodeposited hard chromium and pure aluminum by a high-dose ion-beam source are presented and compared to plasma-source ion implantation. The large-area, high current density ion-beam source can be characterized, with respect to surface modification use, by a uniform emitted dose rate in the range of 1016 to 5 × 1017 N cm−2 min−1 over an area of <100 cm2 and with acceleration energies of 10–50 keV. The implantation range and retained dose (measured using ion-beam analysis), the surface hardness, coefficient of friction, and the change in the wear coefficient (measured by nanohardness indentation and pin-on-disk wear testing) that were obtained with an applied dose rate of ∼1.7 × 1017 N cm−2 min−1 at 25 kV are given, and they are compared to results obtained with plasma-source ion implantation.
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ABSTRACT We propose a grid-stabilized plasma cathode based on a slit-contracted low-pressure glow discharge with hollow anode. The area of the plasma cathode is one order of magnitude higher than that in systems where electrons are... more
ABSTRACT We propose a grid-stabilized plasma cathode based on a slit-contracted low-pressure glow discharge with hollow anode. The area of the plasma cathode is one order of magnitude higher than that in systems where electrons are extracted immediately from plasma in the cathode cavity. Conditions for the discharge initiation, the current switching to the hollow anode, and the obtaining of uniform emission from the plasma cathode are determined. At an accelerating voltage of 160 kV, an electron beam with a 1000 × 180 mm cross section, a total current of several amperes, and a current pulse duration of up to 10−3 s was obtained. The plasma cathode operates under technical vacuum conditions (air, 0.1 Pa) and ensures high stability and reproducibility of the beam current pulses.
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ABSTRACT electrons with an energy of up to 300 eV under a gas pressure of 0.1—1.0 Pa at a current density lower than 0.1 A/cm2. It is shown that the dependence of the floating potential on the initial electron energy is non� monotonic;... more
ABSTRACT electrons with an energy of up to 300 eV under a gas pressure of 0.1—1.0 Pa at a current density lower than 0.1 A/cm2. It is shown that the dependence of the floating potential on the initial electron energy is non� monotonic; this fact is explained by the variation of the ratio of the ion current density to the density of fast electron current in the plasma. The balance of the electron and ion currents on the surface of an insulated electrode is ensured by the cutoff of the low�energy part of the electron flow at the level determined by the magnitude of the floating potential. The maximal value of the floating potential increases upon a decrease in the gas pressure; this is due to a decrease in the ion current density. The interval of energy variation in which the floating potential decreases from the maximal value (50–250 eV) to 5–6 eV increases with the electron current density and the gas pressure. The electrode material and the type of the gas do not noticeably affect the variation of the floating potential.
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Abstract The principle of operation and characteristics of a broad electron beam source based on the discharge with a self-heated hollow cathode and widened anode part are described. The source is intended for the ion nitriding of metals... more
Abstract The principle of operation and characteristics of a broad electron beam source based on the discharge with a self-heated hollow cathode and widened anode part are described. The source is intended for the ion nitriding of metals in the electron beam ...
ABSTRACT Composite TiC/a-C:H coatings with a thickness of 5 μm are produced by the reactive magnetron sputtering of titanium in an Ar/C2H2 gas mixture, which was additionally irradiated by a wide electron beam with an energy of 100 eV and... more
ABSTRACT Composite TiC/a-C:H coatings with a thickness of 5 μm are produced by the reactive magnetron sputtering of titanium in an Ar/C2H2 gas mixture, which was additionally irradiated by a wide electron beam with an energy of 100 eV and an electric current of up to 1 A. The composition of the coatings is controlled by changing the C2H2 flow rate in the range from 1 to 16 mL/min under a constant Ar flow rate (40 mL/min) and magnetron current (2 A, 10 μs, 50 kHz). X-ray diffraction (XRD) investigations and high resolution transmission electron microscopy (HRTEM) methods confirm the formation of nanostructured coatings with a thickness of 4 to 9 nm. The hardness of the coatings nonmonotonically depends on the acetylene flow rate. A maximum microhardness of 30 GPa is obtained when the atomic concentration of titanium in the coating determined by the Auger spectroscopy method is close to 38%. It is established that the electron beam irradiation of a gas mixture during the deposition of coatings promotes the accelerated decomposition of acetylene and leads to a multiple (from 10 to 2 mL/min) decrease in the C2H2 flow rate, at which the maximum microhardness of coatings is reached.
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A two-stage source of a broad beam of gas ions is described. The source contains a grid-stabilized plasma cathode and an anode stage with a multicusp magnetic field. The emission current of the plasma cathode (which is based on a glow... more
A two-stage source of a broad beam of gas ions is described. The source contains a grid-stabilized plasma cathode and an anode stage with a multicusp magnetic field. The emission current of the plasma cathode (which is based on a glow discharge with a hollow cathode) is controlled between 0.1 and 1 A. The voltage that is applied to a bipolar diode between its cathode grid and anode plasma and determines the energy of fast electrons ranges from 50 to 200 V. The operating pressure of the argon in the anode stage is 4 × 10-3-1 × 10-1 Pa. A beam of argon ions having an energy of up to 5 keV and a current of >100 mA is formed by a two-electrode ion-optical system with a working area of ~50 cm2.
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ABSTRACT A source of gas ions (argon, oxygen, nitrogen, etc.), the operating principle of which is based on the use of a glow discharge in an electrode system of a wide-aperture hollow cathode and anode in a magnetic field, is described.... more
ABSTRACT A source of gas ions (argon, oxygen, nitrogen, etc.), the operating principle of which is based on the use of a glow discharge in an electrode system of a wide-aperture hollow cathode and anode in a magnetic field, is described. The exit aperture diameter of the hollow cathode, increased up to a size close to the ion beam diameter (10 cm), ensures the uniform ion emission of the plasma generated in the discharge region near the anode. A decreased angular divergence or increased ultimate ion-beam current density is achieved by a change in the potential drop in the space charge sheath between the plasma and the ion optics. The source generates broad (50 cm2) slightly diverging (ω/2∼3°–5°) ion beams with energies of 300–1000 eV at a beam current density of ∼0.5 mA/cm2.
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ABSTRACT
invention relates to the field of nanotechnologies related to methods to process nanosize materials. The method to process nanosize materials based on aluminium oxide includes pulse action at materials of Fe+ ion beam with current density... more
invention relates to the field of nanotechnologies related to methods to process nanosize materials. The method to process nanosize materials based on aluminium oxide includes pulse action at materials of Fe+ ion beam with current density of 8-8.5 mA/cm2, duration of pulses of 200-600 mcs, accelerated ions energy of 25-50 keV and fluence of 1017 -3·1017 cm-2. EFFECT: conversion of metastable -, - and other phases of aluminium oxide into -phase, with preservation of nanoparticles dimensions in a modified material, provision of high hardness and stability of surface layers of nanoceramics or compacted powdery nanomaterials based on aluminium oxide.
The influence of long-term isotermal oxidation on the area specific resistance (ASR) and the elemental composition of the cathode/inter-connect structure under typical for solid oxide fuel cell operating temperatures and current density... more
The influence of long-term isotermal oxidation on the area specific resistance (ASR) and the elemental composition of the cathode/inter-connect structure under typical for solid oxide fuel cell operating temperatures and current density was investigated. The interconnects (IC) were made from Crofer22 APU steel coated with a Mn–Co–O spinels of different composition. The LSM-based contact paste used to improve the electric contact between LSM-cathode and interconnect. The essential effect of temperature (800 and 850 °C) and Mn–Co–O spinel composition on the value and time dependence of ASR were found out. It is assumed that this effect is determined by faster growth of chromia layer under 850 °C and multiple change of Mn : Co ratio in the coating during the testing. The experimental facility and modes of protective coating deposition by pulsed reactive magnetron sputtering of Mn–Co targets were described.
A method of Mn-CoO coatings deposi-tion on chromium-based alloy has been described. This method is based on ion-beam-assisted coating deposition by magnetron sputtering of metallic targets. The effect of the coating deposition conditions... more
A method of Mn-CoO coatings deposi-tion on chromium-based alloy has been described. This method is based on ion-beam-assisted coating deposition by magnetron sputtering of metallic targets. The effect of the coating deposition conditions and yttrium additions on the microstructure and the elemental composition of the coatings and the interface after isothermal oxidation in air at 800 °C has been considered. The results of measuring of the steel oxidation rate and the area specific resistance of the coating in contact with an Sr-doped lanthanum manganite (LSM) cathode have been given. Long-term (8800 hours in a continuous operating regime) tests of a prototype solid oxide fuel cell module, which was outfitted with coated and un-coated interconnects, showed that the protective coating reduces the power loss from an increase in the contact resistance between an LSM cathode and an interconnect by 10%, extending the lifetime for ~4500 hours.
We have proposed a concept and studied properties of a plasma cathode with a large emitting plasma area. The plasma cathode employed a low-pressure glow discharge with a hollow anode and a hollow cathode having a long slit outlet... more
We have proposed a concept and studied properties of a plasma cathode with a large emitting plasma area. The plasma cathode employed a low-pressure glow discharge with a hollow anode and a hollow cathode having a long slit outlet aperture. Conditions ensuring operation of the discharge with a uniform distribution of the current over the slit length have been determined, providing homogeneous emission along the large axis of the grid plasma cathode. The transverse inhomogeneity of emission depended on the distance between the emission grid and the cathode aperture. It was adjusted by changing transparency of the plasma cathode grid along the short axis. The electron plasma emitter 350×100 mm in size was tested in a pulsed repetitive regime of the discharge operation at a current of 1–10 A, a current pulse length of 1 ms, and a gas pressure of 0.01–0.05 Pa. This principle was used in the development of a plasma cathode having a surface area of 20×100 cm for an electron accelerator wit...
Abstract: FIELD: heavy-current plasma and ion beam generation. SUBSTANCE: proposed cold-cathode ion source has plasma cathode whose set of electrodes includes glow-discharge hollow cathode, igniter electrode, and anode grid; plasma... more
Abstract: FIELD: heavy-current plasma and ion beam generation. SUBSTANCE: proposed cold-cathode ion source has plasma cathode whose set of electrodes includes glow-discharge hollow cathode, igniter electrode, and anode grid; plasma generator incorporating main anode and screen grid with ion extraction holes electrically connected to anode grid and placed at negative potential relative to main hollow anode whose surface mounts set of permanent magnets for producing peripheral multipole magnetic system. Anode grid is mounted on hollow glow-discharge anode end facing main anode, its opposite end mounts diaphragm with anode aperture coaxial with cathode aperture, following relations being satisfied: da > dc and dg < D - 2h, where da, dc, dg, D is diameter of anode aperture, diameter of cathode aperture, diameter of anode grid, and diameter of main anode, respectively; h is minimal distance between rows of different-polarity permanent magnets. EFFECT: enhanced power efficiency, gas...
Dependences of the ion current extracted from the anode plasma on the working gas (argon) pressure were meaa sured for variants of a twoostage electrode system, which had different surface areas of the gridded plasma cathode and... more
Dependences of the ion current extracted from the anode plasma on the working gas (argon) pressure were meaa sured for variants of a twoostage electrode system, which had different surface areas of the gridded plasma cathode and configurations of the multipole magnetic system. It was shown that the current of ions extracted from the anode plasma dee pended on conditions used for injection of fast electrons to the second stage. These conditions were considerably different for linear and ring magnetic multipole systems. The maximum energy efficiency of the ion generation, which was calculated from the ratio of the ion current to the screen electrode of the ion optics to the total discharge power, was as large as 1.6–1.9 A/kW at the discharge current in the first stage equu al to 0.2–2 A and the second stage voltage equal to 150 V. The energy efficiency of the ion source was 0.5 A/kW when an argon ion beam having the energy of 4.5 keV, the crossssecc tion of 50 cm 2 and the total curre...
FIELD: physics. SUBSTANCE: invention relates to plasma engineering, and more specifically to generation of ion beams with large cross-sectional area. The source of wide-aperture ion beams has a plasma cathode based on glow discharge, the... more
FIELD: physics. SUBSTANCE: invention relates to plasma engineering, and more specifically to generation of ion beams with large cross-sectional area. The source of wide-aperture ion beams has a plasma cathode based on glow discharge, the electrode system of which comprises a hollow cathode 1, ignitor electrode 2 and anode grid 3, placed opposite the output aperture of the hollow cathode; and a plasma chamber, which comprises a rod-shaped anode 4 and a hollow cylindrical emitter electrode 5 with openings for extracting ions, electrically connected to the anode grid 3 and lying at negative potential relative the rod-shaped node. Effective ionisation of gas and generation of dense plasma is provided for at a defined ratio of surface areas of the rod-shaped anode and hollow emitter electrode, the value of which depends on the average number of ionisations made by injected fast electrons. Ions are tapped from the plasma through openings in the hollow cylindrical emitter electrode. Chosen...
A nonself-sustained hollow-cathode discharge maintained by emission of a grid-stabilized plasma cathode is studied in an effort to develop high-voltage sources of ribbon ion beams operating in continuous and pulsed-repetitive regimes. The... more
A nonself-sustained hollow-cathode discharge maintained by emission of a grid-stabilized plasma cathode is studied in an effort to develop high-voltage sources of ribbon ion beams operating in continuous and pulsed-repetitive regimes. The conditions necessary for stable emission from the plasma cathode with a coarse-structure grid over a wide interval of discharge currents, generation of extended spatially homogeneous plasma in the hollow cathode is determined, and the dimensions of the rod anode of the onself-sustained discharge in order to improve the ion generation efficiency is optimized. Specific features of the formation of ribbon ion beams by a multi-slit ion optics system with a high geometrical transparency are analyzed. The design and parameters of an ion source operating in the continuous regime and generating a ribbon beam of argon ions with an energy of 40 keV, a cross-sectional area of 450×40 mm and a current of 50 mA are described.
AS-IS-IMPLANTED, NOT ANNEALED!!! Host-material SiO_2-matrix reply to ion-implantation with different 3d-metal ions. PLEASE NOTE: Different degree of ordering in the silica-oxygen amorphous network clearly seen in appropriate X-ray Emission Spectra. Natural Stishovite spectrum is added as a referencemore
This figure displays the X-ray emission (XES) Si L2,3 spectra for dual implanted KU-SiO2:[Co,Mn], single implanted KU-SiO2:[Mn] and reference samples – a-SiO2 and natural stishovite. This XES originates from Si 3d3s → Si 2p1/2,3/2 valence... more
This figure displays the X-ray emission (XES) Si L2,3 spectra for dual implanted KU-SiO2:[Co,Mn], single implanted KU-SiO2:[Mn] and reference samples – a-SiO2 and natural stishovite. This XES originates from Si 3d3s → Si 2p1/2,3/2 valence transition so representing the distribution of 3d3s partial density of states for Si in the Valence Band of the material under study. The most difference in the presented spectra is in their FWHM and strong difference in second sub-band, located at nearly 89 eV (please note, the spectra are normalized to the intensity of the main bad in order to detect precisely the dissimilarities caused by both dual and single implantation). Earlier it was shown (Structural ordering in a silica glass matrix under Mn ion implantation, D A Zatsepin, R J Green, A Hunt, E Z Kurmaev, N V Gavrilov, A Moewes J. Phys.: Condens. Matter 24, 2012, 185402) by means of XRD and XES, that Mn-implantation leads to the to the nucleation and re-ordering of SiO2 host-material (the ...
ABSTRACT The results of measurements of X-ray photoelectron spectra (XPS) of a-SiO2-host material after pulsed implantation with [Mn+] and [Co+, Mn+]-ions as well as DFT-calculations are presented. The low-energy shift is found in XPS Si... more
ABSTRACT The results of measurements of X-ray photoelectron spectra (XPS) of a-SiO2-host material after pulsed implantation with [Mn+] and [Co+, Mn+]-ions as well as DFT-calculations are presented. The low-energy shift is found in XPS Si 2p and O 1s core-levels of single [Mn+] and dual [Co+, Mn+] pulsed ion-implanted a-SiO2 (E = 30 keV, D = 2*10^17 cm^-2) with respect to those of untreated a-SiO2.The similar changes are found in XPS Si 2p and O 1s of stishovite compared to those of quartz. This means that the pulsed ion-implantation induces the local high pressure effect which leads to an appearance of SiO6-structural units in alpha-SiO2 host, forming &quot;stishovite-like&quot; local atomic structure. This process can be described within electronic bonding transition from the four-fold &quot;quartz-like&quot; to six-fold &quot;stishovite-like&quot; high-pressure phase in SiO2 host-matrix. It is found that such octahedral conversion depends on the fluence and starts with doses higher than D = 3*10^16 cm^-2.
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B. K. Sokolov, V. V. Gubernatorov, Yu. N. Dragoshanskii, A. P. Potapov, V. V. Ovchinnikov, N. V. Gavrilov, B. Yu. Goloborodskii, D. R. Emlin, E. P. Mikhalishcheva, I. S. Mikhailov, L. V. Oshurko, L.V. The effect of ion-beam treatment with... more
B. K. Sokolov, V. V. Gubernatorov, Yu. N. Dragoshanskii, A. P. Potapov, V. V. Ovchinnikov, N. V. Gavrilov, B. Yu. Goloborodskii, D. R. Emlin, E. P. Mikhalishcheva, I. S. Mikhailov, L. V. Oshurko, L.V. The effect of ion-beam treatment with argon ions (20 keV) on the magnetic losses of soft magnetic materials (grade 3424 and grade 3414 anisotropic electrical steels made of the Fe-3 wt % Si alloy, and an Fe73.5Cu1Nb3Si13.5B9 alloy in amorphous and nanocrystalline states) were investigated under various magnetization reversal conditions. The magnetic losses were found to reduce under certain regimes of ion treatment. This reduction of losses was shown (using anisotropic steels as an example) to be accompanied by increasing coercive force and decreasing magnetic induction. Ion-beam treatment results in a reconstruction of the magnetic domain structure in ferromagnetic alloys (with the formation of a surface magnetic structure with very narrow transversely oriented regions), which changes...
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copper and titanium ions are implanted into quartz glass with radiation dose of 5×1015 - 2×1017 cm 2 and current density of 10 mcA/cm2, followed by thermal treatment of the luminophore in an air atmosphere at temperature 750-900°C for 1-2... more
copper and titanium ions are implanted into quartz glass with radiation dose of 5×1015 - 2×1017 cm 2 and current density of 10 mcA/cm2, followed by thermal treatment of the luminophore in an air atmosphere at temperature 750-900°C for 1-2 hours. Copper ions are implanted at ion energy of 35-40 keV and titanium ions are implanted at ion energy of 40-45 keV. After thermal treatment, the luminophore is treated with UV radiation with wavelength 240-260 nm. The UV source used can be a 100-200 W ultra-high pressure mercury lamp with luminous efficacy of 30-40 lm/W, a 400 W low-pressure deuterium lamp or a 300 W KrF excimer laser with wavelength 248 nm. EFFECT: high stability of luminescence spectrum and possibility of controlling said spectrum.
ABSTRACT A source of gas-ion ribbon beams on the basis of a glow discharge in a prolonged electrode system with a closed drift of fast electrons is described. This drift ensures a uniform plasma ion emission in the transverse direction... more
ABSTRACT A source of gas-ion ribbon beams on the basis of a glow discharge in a prolonged electrode system with a closed drift of fast electrons is described. This drift ensures a uniform plasma ion emission in the transverse direction relative to the magnetic induction vector. A discharge with a current of up to 3.5 A and a voltage of 400–600 V in a magnetic field of 6 mT is maintained under a gas flow of 40 cm3atm/min and ensures a saturation ion current density from plasma of up to 4 mA/cm2 (5%) over a length of 50 cm. Using slit-type optics with an aperture of 50 1 cm, a ribbon beam with a current of up to 0.2 A and an energy of argon ions of up to 25 keV has been obtained. Methods of the concentration of discharge near the emissive slit and the effect of the electron drift on the ion emission from the plasma are considered. The optimal conditions for ion beam formation are determined.
SUBSTANCE: invention relates to doped quartz glass with a tetrahedral coordination of titanium atoms and can be used in designing optoelectronic and light-emitting devices. The doped quartz glass with tetrahedral coordination of titanium... more
SUBSTANCE: invention relates to doped quartz glass with a tetrahedral coordination of titanium atoms and can be used in designing optoelectronic and light-emitting devices. The doped quartz glass with tetrahedral coordination of titanium atoms is a base which consists of silicon dioxide with a surface layer containing titanium dioxide and silicon dioxide. The surface layer has thickness of 35-45 nm, contains 7-12 mol % titanium dioxide and 93-88 mol % silicon dioxide, wherein 97-99% of titanium atoms are in tetrahedral coordination. EFFECT: improved optical transparency and wider field of use.
proposed method comprises implanting titanium ions in quartz glass in pulse mode with radiation dose of (1-9)·1016 cm-2 at titanium ion energy of 25-35 keV, ion current pulse density of 0.2-10 mA/cm2 and quartz glass temperature of... more
proposed method comprises implanting titanium ions in quartz glass in pulse mode with radiation dose of (1-9)·1016 cm-2 at titanium ion energy of 25-35 keV, ion current pulse density of 0.2-10 mA/cm2 and quartz glass temperature of 250-300°C under isothermal conditions. EFFECT: simplified process to assist in fabricating functional micro and nano devices.
ABSTRACT The composition, structure, and properties of TiC/a�C:H coatings obtained by simultaneous vac� uum�arc deposition of titanium and carbon in a low�pressure argon–acetylene medium additionally acti� vated by a low�energy (a few... more
ABSTRACT The composition, structure, and properties of TiC/a�C:H coatings obtained by simultaneous vac� uum�arc deposition of titanium and carbon in a low�pressure argon–acetylene medium additionally acti� vated by a low�energy (a few hundreds of electron�volts) electron beam. The creation of conditions under which the decomposition of acetylene is provided by the ionization and dissociation of molecules due to elec� tron impacts and by the recharging of molecules through titanium and argon ions with subsequent dissocia� tion should favor the most complete decomposition of acetylene in a wide range of pressures. With increasing acetylene pressure, the structure of the nanocomposite coating changes: the size of TiC crystallites decreases, and the fraction of interfaces (or the fraction of regions with a disordered (amorphous) structure) increases. The application of a bias voltage leads to an increase in the sizes of TiC nanocrystallites. The coatings with a maximum microhardness (~40 GPa) have been obtained without the action of an electron beam under an acetylene pressure of ~0.05–0.08 Pa and the atomic ratio Ti : C ~ 0.9 : 1.1 in the coating.
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A method for formation of a plasma emitter of a ribbon ion beam source, which em- ploys a two-stage electrode system of a glow dis- charge in a single-cusp linear magnetic field, has been proposed and analyzed. Electrons are emitted by a... more
A method for formation of a plasma emitter of a ribbon ion beam source, which em- ploys a two-stage electrode system of a glow dis- charge in a single-cusp linear magnetic field, has been proposed and analyzed. Electrons are emitted by a ribbon grid-bounded plasma cathode along magnetic field lines, are accelerated in a bipolar diode between the grid and
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The characteristics of coatings prepared by acetylene decomposition in non-self-sustained discharge with a plasma cathode have been studied. The initial energy of electrons injected into the plasma was 0,1 – 0,7 keV, energy of ions... more
The characteristics of coatings prepared by acetylene decomposition in non-self-sustained discharge with a plasma cathode have been studied. The initial energy of electrons injected into the plasma was 0,1 – 0,7 keV, energy of ions bombarding the coating was 0,1 – 0,7 keV and the pressure of Ar + C 2 H 2 gas mixture was 0,2 – 1 Pa. Microhardness and wear resistance of coatings were measured by methods of kinetic indentation and ball abrasion. The coatings with high microhardness (40 – 60 GPa) and high wear resistance were deposited on conditions that ion energy exceeded 300 eV. It was shown that coating's microhardness and internal stresses in the coatings deposited on chamber walls could be reduced by concerted change of voltage accelerating injected electrons and bias voltage applied to samples placed into the plasma. This allows to avoid delamination of coating particles from the walls and to provide high quality coat-ing on samples.
ABSTRACT We have studied the effect of bombardment by Cu+ and Ti+ ions with energy 30 keV on the optical absorption and luminescence of F centers in oxygen-deficient aluminum oxide. We have shown that in the induced optical absorption... more
ABSTRACT We have studied the effect of bombardment by Cu+ and Ti+ ions with energy 30 keV on the optical absorption and luminescence of F centers in oxygen-deficient aluminum oxide. We have shown that in the induced optical absorption spectra there are six components of gaussian shape, which can be assigned to absorption bands of F+, F2, and F2+ centers. We have established that bombardment of the samples by ion beams has a weak effect on the thermoluminescence parameters in the 3.0 eV and 2.4 eV bands, while in the 3.8 eV luminescence band for F+ centers, the thermoluminescent response increases considerably.