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Mid-Infrared Lasing of Single Wurtzite InAs Nanowire

  • Hisashi Sumikura*
    Hisashi Sumikura
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    *E-mail: [email protected]
  • Guoqiang Zhang
    Guoqiang Zhang
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    More by Guoqiang Zhang
  • Masato Takiguchi
    Masato Takiguchi
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
  • Naotomo Takemura
    Naotomo Takemura
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
  • Akihiko Shinya
    Akihiko Shinya
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    More by Akihiko Shinya
  • Hideki Gotoh
    Hideki Gotoh
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    More by Hideki Gotoh
  • , and 
  • Masaya Notomi
    Masaya Notomi
    NTT Basic Research Laboratories, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    Nanophotonics Center, Nippon Telegraph and Telephone Corporation, Atsugi, Kanagawa 243-0198, Japan
    More by Masaya Notomi
Cite this: Nano Lett. 2019, 19, 11, 8059–8065
Publication Date (Web):October 22, 2019
https://doi.org/10.1021/acs.nanolett.9b03249
Copyright © 2019 American Chemical Society

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    Abstract

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    Mid-infrared (MIR) photonics is a developing technology for sensing materials by their characteristic MIR absorptions. Since silicon (Si) is a low-loss material in most of the MIR region, Si photonic structures have been fabricated to guide and confine MIR light, and they allow us to achieve sensitive and integrated sensing devices. However, since the implementation of MIR light sources on Si is still challenging, we propose a thick indium arsenide (InAs) nanowire as an MIR laser that can couple to Si photonic structures with material manipulation. In this study, thick InAs nanowires are grown on an indium phosphide substrate with a self-catalyst vapor–liquid–solid method and transferred to gold-deposited SiO2/Si substrates. Low-temperature microphotoluminescence (PL) spectroscopy shows that InAs nanowires exhibit broad PL peaking at a wavelength of around 2.6 μm (3850 cm–1 in frequency), which corresponds to the bandgap energy of wurtzite InAs. At high optical pump fluences, single InAs nanowire exhibits sharp emission peaks, while their integrated intensity and polarization degree increase abruptly at the threshold pump fluence. These nonlinear behaviors indicate that the MIR lasing action takes place in the InAs nanowire in its cavity mode. Our demonstration of the MIR nanowire laser expands the wavelength coverage and potential application of semiconductor nanowires.

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    The Supporting Information is available free of charge on the ACS Publications website at DOI: 10.1021/acs.nanolett.9b03249.

    • Emission spectra and polarization for NW4, temperature-dependent PL from a zinc-blend InAs wafer, additional information regarding numerical simulation, and theoretical curve fitting (PDF)

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