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Advances of microwave plasma-enhanced chemical vapor deposition in fabrication of carbon nanotubes: a review

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Abstract

Microwave plasma chemical vapor deposition (MPCVD) has received tremendous research interest in fabrication of carbon nanotubes (CNTs) due to its unique advantages of high reactivity, rapid heating, no pollution, good controllability, etc. It would be meaningful to summarize the efforts that have been devoted in this area. Up to now, no such review has been seen in the literature. In this review, a summarization and discussion of the MPCVD devices applied in CNTs fabrication are firstly given, followed by the discussion on effect and affecting mechanisms of H2 plasma pretreatment, nitrogen atoms in the reacting gases and microwave power. Notably, the parameters of as-synthesized CNTs products and the corresponding synthesizing MPCVD conditions are listed out. Finally, the capabilities of MPCVD in facilitating atmospheric-pressure, low-temperature and in situ growth of CNTs are reviewed. This review can give a comprehensive grasp of current progress and understanding of MPCVD in preparation of CNTs and may provide a useful guidance for readers to design their fabricating systems to obtained required CNTs using MPCVD.

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reproduced with permission from reference [97]. Copyright [2007], [Elsevier].); and d-g cross section TEM images of Pt-CNT growth after a pretreatment of d 0 and e 3 min. Corresponding plan-view SEM images f and g, respectively, of residual nanoparticles embedded in the substrate and separated from the nanotubes as a result of TEM preparation procedures (reproduced with permission from reference [99]. Copyright [2011], [Elsevier Ltd].)

Figure 5

(reproduced with permission from reference [77]. Copyright [2002], [Elsevier].); b catalytic model by the introduction of I) N*; II) H*; III) N*and H* (reproduced with permission from reference [107]. Copyright [2019], [Royal Society of Chemistry].)

Figure 6

reproduced with permission from reference [78]. Copyright [2002], [Elsevier BV].)

Figure 7

reproduced with permission from reference [79]. Copyright [2006], [Elsevier].)

Figure 8
Figure 9

(reproduced with permission from reference [80]. Copyright [2004], [Elsevier Inc].)

Figure 10

(reproduced with permission from reference [103]. Copyright [2006], [Elsevier BV]); b a schematic diagram of CNT growth using Fe-Si as catalyst: (i) Fe–Si becomes Fe–Si–C with an equilibrium carbon concentration (Csp) during the incubation period. Cm refers to the methane concentration; (ii) CNT begins to grow from the catalyst, causing the carbon concentration at the interface between the catalyst and CNT to decrease to Cicnt; (iii) the growth terminates when Cicnt increases to Csp due to the rapid diffusion of carbon atoms in Fe–Si–C (reproduced with permission from reference [102]. Copyright [2004], [Elsevier].)

Figure 11

(reproduced with permission from reference [33]. Copyright [2018], [Elsevier BV].)

Figure 12

reproduced with permission from reference [125]. Copyright [2007], [Elsevier BV].); and f SEM image of CNTs on the hydroxyapatite (Adapted with permission from reference [127]. Copyright [2012], [Elsevier BV].)

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Abbreviations

CNT(s):

Carbon nanotube(s)

CVD(s):

Chemical vapor depositions

PECVD:

Plasma-enhanced chemical vapor deposition

MPCVD:

Microwave plasma (enhanced) chemical vapor deposition

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Acknowledgements

This work was financially supported by the National Natural Science Foundation of China (Grant No. 61801314), National Natural Science Foundation of China (Grant No. 61731013), Sichuan Science and Technology Program (Grant No. 2019YFH0078) and Fundamental Research Funds for the Central Universities of China (Grant No. YJ201703).

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Authors and Affiliations

  1. College of Electronics and Information Engineering, Sichuan University, Chengdu, 610065, China

    Yanjing Liu, Jiawei He, Yanping Zhou & Kama Huang

  2. School of Electronic and Communication Engineering, Guiyang University, Guiyang, 550005, China

    Wencong Zhang

  3. College of Resources and Environment, Baoshan University, Baoshan, 678000, China

    Nan Zhang

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  1. Yanjing Liu
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  3. Nan Zhang
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Correspondence to Wencong Zhang or Yanping Zhou.

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Liu, Y., He, J., Zhang, N. et al. Advances of microwave plasma-enhanced chemical vapor deposition in fabrication of carbon nanotubes: a review. J Mater Sci 56, 12559–12583 (2021). https://doi.org/10.1007/s10853-021-06128-1

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