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Large Area, Few-Layer Graphene Films on Arbitrary Substrates by Chemical Vapor Deposition

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Department of Materials Science and Engineering, Department of Electrical Engineering and Computer Science, Department of Physics, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139
* To whom correspondence should be addressed. E-mail: [email protected]
†Department of Materials Science and Engineering.
‡Department of Electrical Engineering and Computer Science.
§Department of Physics.
Cite this: Nano Lett. 2009, 9, 1, 30–35
Publication Date (Web):December 1, 2008
https://doi.org/10.1021/nl801827v
Copyright © 2008 American Chemical Society
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    Abstract

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    In this work we present a low cost and scalable technique, via ambient pressure chemical vapor deposition (CVD) on polycrystalline Ni films, to fabricate large area (∼cm2) films of single- to few-layer graphene and to transfer the films to nonspecific substrates. These films consist of regions of 1 to ∼12 graphene layers. Single- or bilayer regions can be up to 20 μm in lateral size. The films are continuous over the entire area and can be patterned lithographically or by prepatterning the underlying Ni film. The transparency, conductivity, and ambipolar transfer characteristics of the films suggest their potential as another materials candidate for electronics and opto-electronic applications.

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