We investigate poly(methylmethacrylate) (PMMA) development processing with cold developers (4–10 °C) for its effect on resolution, resist residue, and pattern quality of sub-10 nm electron beam lithography (EBL). We find that low-temperature development results in higher EBL resolution and improved feature quality. PMMA trenches of 4–8 nm are obtained reproducibly at 30 kV using cold development. Fabrication of single-particle-width Au nanoparticle lines was performed by lift-off. We discuss key factors for formation of PMMA trenches at the sub-10 nm scale.
REFERENCES
1.
L.
Guo
,
E.
Leobandung
,
L.
Zhuang
, and
S. Y.
Chou
,
J. Vac. Sci. Technol. B
15
,
2840
(
1997
).
2.
3.
I.
Amlani
,
A.
Orlov
,
G.
Toth
,
G. H.
Bernstein
,
C. S.
Lent
,
G. L.
Snider
,
Science
284
,
289
(
1999
).
4.
US patent 6,128,214, “Molecular Wire Crossbar Memory,” Kuekes, Williams, Heath, HP.
5.
M. Lieberman, S. Chellamma, B. Varughese, Y. Wang, C. Lent, G. H. Bernstein, G. Snider, and F. Peiris, Ann. N.Y. Acad. Sci. 960 (Molecular Electronics II) (2002).
6.
R. P.
Cowburn
and
M. E.
Welland
,
Science
287
,
1466
(
2000
).
7.
8.
H.
Kawano
,
H.
Ito
,
K.
Mizuno
,
T.
Matsuzaka
,
K.
Kawasaki
,
N.
Saitou
,
H.
Ohta
, and
Y.
Sohda
,
J. Vac. Sci. Technol. B
21
,
823
(
2003
).
9.
A. N.
Broers
,
A. C. F.
Hoole
, and
J. M.
Ryan
,
Microelectron. Eng.
32
,
131
(
1996
).
10.
W.
Langheinrich
,
B.
Spangenberg
, and
H.
Beneking
,
J. Vac. Sci. Technol. B
10
,
2868
(
1992
).
11.
12.
W.
Chen
and
H.
Ahmed
,
J. Vac. Sci. Technol. B
13
,
2883
(
1995
).
13.
14.
O.
Dial
,
C. C.
Cheng
, and
A.
Scherer
,
J. Vac. Sci. Technol. B
16
,
3887
(
1998
).
15.
M.
Kamp
,
M.
Emmerling
,
S.
Kuhn
, and
A.
Forchel
,
J. Vac. Sci. Technol. B
17
,
86
(
1999
).
16.
H.
Namatsu
,
Y.
Takahashi
,
K.
Yamazaki
,
T.
Yamaguchi
,
M.
Nagase
, and
K.
Kurihara
,
J. Vac. Sci. Technol. B
16
,
69
(
1998
).
17.
K.
Kurihara
et al.,
Jpn. J. Appl. Phys., Part 1
34
,
6940
(
1995
).
18.
C. S.
Lent
,
P. D.
Tougaw
,
W.
Porod
, and
G. H.
Bernstein
,
Nanotechnology
4
,
49
(
1993
).
19.
Q.
Hang
,
Y.
Wang
,
M.
Lieberman
, and
G. H.
Bernstein
,
Appl. Phys. Lett.
80
,
4220
(
2002
).
20.
Y.
Chen
,
D.
Macintyre
, and
S.
Thomas
,
J. Vac. Sci. Technol. B
17
,
2507
(
1999
).
21.
22.
C. S.
Wu
,
C. D.
Chen
,
S. M.
Shih
, and
W. F.
Su
,
Appl. Phys. Lett.
81
,
4595
(
2002
).
23.
M. J.
Rooks
,
E.
Kratschmer
,
R.
Viswanathan
,
J.
Katine
,
R. E.
Fontana
, Jr., and
S. A.
MacDonald
,
J. Vac. Sci. Technol. B
20
,
2937
(
2002
).
24.
F. J.
Pantenburg
,
S.
Achenbach
, and
J.
Mohr
,
J. Vac. Sci. Technol. B
16
,
3547
(
1998
).
25.
J.
Griffith
,
H. M.
Marchman
, and
L. C.
Hopkins
,
J. Vac. Sci. Technol. B
12
,
3567
(
1994
).
26.
E. A.
Dobisz
,
S. L.
Brandow
,
R.
Bass
, and
L. M.
Shirey
,
J. Vac. Sci. Technol. B
16
,
3695
(
1998
).
27.
J. M.
Ryan
,
A. C. F.
Hoole
, and
A. N.
Broers
,
J. Vac. Sci. Technol. B
13
,
3035
(
1995
).
28.
W.
Hu
,
T.
Orlov
, and
G. H.
Bernstein
,
J. Vac. Sci. Technol. B
20
,
3085
(
2002
).
29.
G.
Bazan
and
G. H.
Bernstein
,
J. Vac. Sci. Technol. A
11
,
1745
(
1993
).
30.
E. Weltmer, Scanservice Co., Tustin, CA.
31.
G. H.
Bernstein
,
D. A.
Hill
, and
W. P.
Liu
,
J. Appl. Phys.
72
,
4088
(
1992
).
32.
M.
Khoury
and
D. K.
Ferry
,
J. Vac. Sci. Technol. B
14
,
75
(
1996
).
33.
SEMICAPS 2000 imaging system, Santa Clara, CA.
34.
Moxtek standard MXS 301CE.
35.
X.
Huang
,
G.
Bazan
,
G. H.
Bernstein
, and
D. A.
Hill
,
J. Electrochem. Soc.
139
,
2952
(
1992
).
36.
T.
Sato
,
D. G.
Hasko
, and
H.
Ahmed
,
J. Vac. Sci. Technol. B
15
,
45
(
1997
).
37.
S.
Griffith
,
M.
Mondol
,
D. S.
Kong
, and
J. M.
Jacobson
,
J. Vac. Sci. Technol. B
20
,
2768
(
2002
).
38.
C. J.
Loweth
,
W. B.
Caldwell
,
X.
Peng
,
A. P.
Alivistos
,
P. G.
Schultz
,
Angew. Chem., Int. Ed.
38
,
1808
(
1999
).
39.
Q.
Hang
,
D. A.
Hill
, and
G. H.
Bernstein
,
J. Vac. Sci. Technol. B
21
,
91
(
2003
).
40.
J. I. Goldstein, D. E. Newbury, P. Echlin, D. C. Joy, A. D. Romig, C. E. Lyman, C. Fiori, and E. Lifshin, Scanning Electron Microscopy and X-Ray Microanalysis: A Text for Biologists, Materials Scientists, and Geologists, 2nd ed. (Kluwer, Dordrecht, 1992).
41.
Gordon M. Barrow, Physical Chemistry for the Life Sciences, 2nd ed. (McGraw-Hill College Div, New York, 1991).
42.
Robert G. Mortimer, Physical Chemistry, 2nd ed. (2000).
43.
L. E.
Ocola
,
D.
Tennant
,
G.
Timp
, and
A.
Novembre
,
J. Vac. Sci. Technol. B
17
,
3164
(
1999
).
44.
P. R.
Deshmukh
,
K. J.
Rangra
, and
O. P.
Wadhawan
,
Vacuum
52
,
469
(
1999
).
45.
International Technology Roadmap for Semiconductors (2002). http://public.itrs.net/Files/2002Update/Home.pdf
46.
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